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The HELIOS series of femtosecond lasers are ultrafast laser systems developed for high-accuracy scientific research and advanced industrial applications. Combining cutting-edge laser technology with precision engineering, they deliver exceptional stability, broad tunability, and superior temporal resolution. The series is categorized into three sub-series: Compact, High-Energy, and High-Power light sources. These options cover a wide performance range, from low single-pulse energy to high output power, making them suitable for demanding applications such as ultrafast optics, laser micromachining, biomedical imaging, and three-photon microscopy.

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  • Ultra-High Precision Processing– Enables micron-level cutting and structuring with minimal heat-affected zone due to ultrashort pulse duration.
  • Wide Power Range Flexibility – Covers 2W to 40W output, suitable for both research and industrial-scale applications.
  • Adjustable Pulse Width – Flexible pulse duration (250 fs to 10 ps) supports diverse experimental and processing requirements.
  • High Beam Quality – TEM₀₀ output with M² < 1.2 ensures excellent focusability and superior processing accuracy.
  • Excellent Power Stability – <0.5% RMS stability provides reliable and consistent performance for long-term operation.
  • High Repetition Rate Versatility – From single shot to 1 MHz, ideal for both precision micromachining and high-throughput tasks.
  • Modular Design Architecture – Easy customization and quick configuration based on specific application needs.
  • Efficient Water Cooling System – Maintains thermal stability and continuous operation in demanding environments.
  • Minimal Thermal Damage – Reduces material deformation, internal stress, and microcracks during processing.
  • Multi-Material Compatibility – Suitable for metals, ceramics, polymers, glass, and composite materials.
  • Ideal for Complex Microfabrication – Perfect for MEMS, microelectronics, precision optics, and delicate components.
  • Reliable Industrial Performance – Engineered and tested for long-term, continuous laboratory and industrial use.
  • Broad Application Capability – Supports ultrafast optics, laser processing, biomedical imaging, and three-photon microscopy.

Specifications

Parameter Specification
Maximum Output Power Up to 40 W
Maximum Single Pulse Energy Up to 2 mJ (customizable)
Pulse Width 250 fs – 10 ps (adjustable)
Repetition Rate Single shot to 1 MHz
Beam Mode TEM00
Beam Quality M2 < 1.2
Power Stability < 0.5% RMS
Cooling Efficient water cooling system
Design Modular design (configurable)

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