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Objective lenses are precision optical components designed for high-resolution imaging, microscopy, laser processing, and scientific applications. Available in Plan Achromatic, Semi-Apochromatic (Fluorite), and Plan Apochromatic types, they offer different levels of chromatic and spherical aberration correction to ensure sharp, flat, and color-accurate images.

LBTEK provides a wide range of infinity-corrected objectives including Olympus, Nikon, Mitutoyo, long working distance, immersion (dry, oil, water), and high-power laser objectives. With multiple magnifications (4X–100X), thread standards (RMS, M26, M32), and compatibility with 180 mm and 200 mm tube lenses, these objectives are ideal for microscopy, precision measurement, industrial inspection, and laser-based imaging systems.

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  • Wide range of objective types: Plan Achromatic, Semi-Apochromatic (Fluorite), and Plan Apochromatic for different levels of aberration correction
  • Infinity-corrected optical design for high-precision imaging and system integration
  • Compatibility with 180 mm and 200 mm focal length tube lenses (Olympus, Nikon, Mitutoyo systems)
  • Standard thread options including RMS (W20.32 × 0.706 mm) and metric mounts for versatile compatibility
  • Long working distance options for industrial inspection, metrology, and laser applications
  • Available in dry, oil-immersion, and water-immersion configurations
  • Semi-apochromatic and apochromatic models for enhanced color correction and superior image quality
  • High-power laser objectives suitable for focusing and collimating laser beams (1030–1064 nm)
  • Visible-range chromatic correction enabling coaxial observation during laser processing
  • Optimized field flatness with reduced chromatic and spherical aberrations
  • Broad application support including microscopy, laser processing, spectroscopy, and precision measurement
  • Immersion oil available to increase numerical aperture (NA) and improve resolution and light transmission
  • Designed for high-resolution imaging, stable optical performance, and demanding scientific and industrial environments

Specifications

Parameter Specifications
Objective Types Plan Achromatic, Plan Semi-Apochromatic (Fluorite), Plan Apochromatic, Long Working Distance (LWD), High-power Laser Objectives
Optical Design Infinity-corrected plan optical design (achromatic / semi-apochromatic / apochromatic)
Compatible Systems Olympus, Nikon, Mitutoyo, and equivalent infinity-corrected optical systems
Tube Lens Compatibility 180 mm and 200 mm focal length tube lenses (model dependent)
Thread Standards RMS (W20.32 × 0.706 mm), M26 × 0.706 mm, M32 (model dependent)
Magnification Range 4X to 100X (including 5X, 10X, 16X, 20X, 25X, 40X, 50X, 60X, 100X)
Numerical Aperture (NA) 0.10 to 1.30 (depending on model and immersion type)
Working Distance Approx. 0.12 mm to 37.5 mm (including long working distance options)
Wavelength Range 100–2500 nm (UV to NIR, model dependent)
Standard Visible Range 400–700 nm (typical imaging applications)
Extended Spectral Options 266–532 nm, 355–532 nm, 380–900 nm, 436–656 nm, 480–1800 nm
Laser Processing Range 1030–1064 nm (high-power laser objectives)
Immersion Types Dry, Oil-immersion, and Water-immersion options available
Field Correction Plan (flat-field) correction with reduced chromatic aberration, astigmatism, and field curvature
Long Working Distance Available for industrial inspection, metrology, and laser applications
Mounting Compatibility Standard microscope mounts and optical integration via RMS and metric threads
Optical Performance High resolution, high contrast, and enhanced color correction across multiple spectral lines
Laser Compatibility Suitable for focusing and collimating high-power laser beams with visible to NIR chromatic correction
Accessories Compatibility Tube lenses, immersion oil (Olympus/Nikon), dual objective mounts (M32 × 0.75)
Applications Microscopy, fluorescence imaging, DIC, spectroscopy, laser processing, wafer inspection, precision measurement, industrial optical imaging

Applications

  • Optical microscopy and biological imaging
  • Bright-field, fluorescence, DIC, phase-contrast, and polarized light microscopy
  • Semiconductor and wafer inspection
  • Industrial inspection and quality control
  • Precision measurement and metrology systems
  • Laser processing (cutting, engraving, micromachining)
  • Laser beam focusing and collimation (1030–1064 nm applications)
  • Spectroscopy and optical analysis
  • Materials science and surface analysis
  • Research laboratories and scientific experiments
  • Machine vision and automated optical inspection (AOI)
  • Photonics and optoelectronic system integration
  • Microelectronics and PCB inspection
  • Educational and academic microscopy setups
  • High-resolution imaging in UV, visible, and NIR spectral ranges

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